SPIE, the international society for optics and photonics, is holding its annual Advanced Lithography & Patterning Conference in San Jose, California from April 24th-28th. This conference gathers a community of experts in semiconductor design and fabrication to review current research, discuss major breakthroughs, and network with peers.
EsgeeTech’s paper, “VizGlow-MPS: a multi-fidelity process simulator for fast, yet accurate, semiconductor process design and optimization,” is being featured as part of the conference program. The paper discusses how high-fidelity models made with our software, VizGlow™ , provide experimentally validated results for equipment operation that inform reduced-order models which predict results in a few minutes of wall-clock time. The approach constitutes a “digital twin” for process reactors with multiple levels of fidelity that a process engineer can choose from. This approach is demonstrated on c-C4F8 inductively coupled plasma and pulsed CF4/H2 capacitively coupled plasma widely used in etching applications.
Esgee’s presentation is on April 27th from 2:50 PM – 3:10 PM PDT (4:50PM – 5:10PM CST) in Convention Center room 210C.