News

Esgee to present at 71st GEC in Portland

October 30th, 2018 helical resonator plasma simulation

Esgee Technologies will be attending the 71st Annual Gaseous Electronics Conference in Portland, Oregon next week, November 5 – 9. Join Esgee Tech’s Rochan Upadhyay for his talk on “Computational Modeling and Simulation of a Resonant Plasma Source.” He’ll demonstrate how electrical resonance can be exploited to extend low temperature, unmagnetized plasma sources beyond their typical operating limits. Esgee also supported the work being presented by Tokyo Electron America’s Peter Ventzek. He will present “Parametric Modeling and […]


Esgee to Present at SCTC 2018: Hybrid Model of RF Gridded Ion Thruster

June 13th, 2018 Hybrid Plasma Ion Thruster Simulation

Esgee will present “Hybrid Fluid-Particle Plasma Modeling of a Radio-Frequency Gridded Ion” at the 15th Spacecraft Charging Technology Symposium 25-29 June, 2018 at the Integrated Research Center of Kobe University in Japan.   Abstract We present a hybrid, fluid-particle plasma model that is used to investigate the plasma discharge and ion extraction behaviors of a radio-frequency gridded ion thruster (RIT). The hybrid approach combines a fluid formulation for plasma governing equations with a kinetic particle formulation […]


Dust Particle Charge-up in a Corona Discharge

April 18th, 2018 dust-particle-chargeup-plasma-corona

This example demonstrates charge-up of initially charge-free dust particles as they move through a pin-corona plasma. Two sets of particles move through the corona with different initial velocities. The dust particles are subject to Lorentz forcing in the electric field and their resulting trajectories are compared. The macroscopic particle dynamics is modeled in VizGrain and coupled to a background plasma solution modeled in VizGlow. The 2D planar pin geometry and mesh is shown in Figure […]


Fluid vs Hybrid Plasma Formulations for IEADFs in Semiconductor Reactors

February 20th, 2018 Capacitively Coupled Plasma Simulation in VizGlow

Ion energy and angular distribution functions (IEADFs) characterize the anisotropic impact behavior of ions onto wafer surfaces in cold plasma reactive ion etchers (RIE). IEADFs can be used to quantify the etching performance and guide reactor design in the semiconductor fabrication process. Reducing the angles of ion impact at the wafer surface sharpens the resolution of the etching process, enabling the production of smaller etched features. Controlling the ion energy distributions also offers control over […]


Ion Momentum and Drift Diffusion Approximation in VizGlow

February 7th, 2018

When setting up a new non-equilibrium plasma simulation in VizGlow, the user must select an ion momentum model. Two available options in VizGlow are “Solve ion momentum equation” and “Use drift-diffusion approximation.” This discussion is intended to help a new user understand the differences between these options and to determine which selection is appropriate for their problem. The drift-diffusion relationships are derived from the species momentum equations and characterizes the spatial transport of particles. Drift […]