Kinetic PIC Modeling of Ion Beam Neutralization

October 4th, 2018 PIC beam neutralization

Ion beam neutralization is a significant challenge in electric propulsion and is needed to reduce beam electric fields, manage space charge, and reduce ion sputter of the spacecraft. To address these challenges, simulation can be used to investigate ion/electron interactions, predict space charge distributions, and optimize system properties, such as cathode location, beamlet current, ion density, and electron temperature. However, beam neutralization can be a challenging problem to simulate due to the extreme difference in […]

ChemZone: Simple Platform for Complex Chemistries

August 1st, 2018 ChemZone Plasma Simulation

Our flagship product, VizGlow, is a powerful, multi-dimensional software tool for simulating industrial, non-equilibrium plasmas. VizGlow can resolve spatial and time accurate plasma discharges with complex reactor geometries in three dimensions using a parallel simulation framework. While it is extremely robust, it is not always the best place to start when implementing a new chemistry mechanism or optimizing a plasma process. For these types of problems, we recommend starting with ChemZone. ChemZone is a fast, […]

Dust Particle Charge-up in a Corona Discharge

April 18th, 2018 dust-particle-chargeup-plasma-corona

This example demonstrates charge-up of initially charge-free dust particles as they move through a pin-corona plasma. Two sets of particles move through the corona with different initial velocities. The dust particles are subject to Lorentz forcing in the electric field and their resulting trajectories are compared. The macroscopic particle dynamics is modeled in VizGrain and coupled to a background plasma solution modeled in VizGlow. The 2D planar pin geometry and mesh is shown in Figure […]

Fluid vs Hybrid Plasma Formulations for IEADFs in Semiconductor Reactors

February 20th, 2018 Capacitively Coupled Plasma Simulation in VizGlow

Ion energy and angular distribution functions (IEADFs) characterize the anisotropic impact behavior of ions onto wafer surfaces in cold plasma reactive ion etchers (RIE). IEADFs can be used to quantify the etching performance and guide reactor design in the semiconductor fabrication process. Reducing the angles of ion impact at the wafer surface sharpens the resolution of the etching process, enabling the production of smaller etched features. Controlling the ion energy distributions also offers control over […]

Ion Momentum and Drift Diffusion Approximation in VizGlow

February 7th, 2018

When setting up a new non-equilibrium plasma simulation in VizGlow, the user must select an ion momentum model. Two available options in VizGlow are “Solve ion momentum equation” and “Use drift-diffusion approximation.” This discussion is intended to help a new user understand the differences between these options and to determine which selection is appropriate for their problem. The drift-diffusion relationships are derived from the species momentum equations and characterizes the spatial transport of particles. Drift […]