OverViz Blog

3D Microwave Plasma MWP Simulation in VizGlow

This example application simulates a steady microwave field in a three-dimensional plasma reactor using in semiconductor materials processing.  The Frequency-Domain Electromagnetic Wave Solver Module of the VizEM is used for this problem. The geometry for the simulation is shown in Figure 1 and comprises a cylindrical processing reactor with an air-filled waveguide port in the top center of the reactor.  The waveguide is rectangular in cross section and comprises an L-bend with a 45o mirror surface

Applications
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Capacitively Coupled Plasma (CCP) discharges in parallel-plate configuration are commonly used in semiconductor and other materials processing applications.  These discharges provide a compact platform in which a plasma can be generated to process a flat wafer surface.  The highly directional ion impact at the wafer surface with high ion impact energies is beneficial to a number of wafer processes; in particular for etch processes.  This application note discusses the simulation of a typical CCP reactor

Applications
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Esgee Technologies Inc. presents “Simulations of Spark-Plug Transient Plasma Breakdown in Automotive Internal Combustion Engines” at SAE World Congress on April 6th, 2017. This work investigates the dynamics of spark breakdown and quantifies its effect on electrode damage for different electrode geometries. Ion bombardment and sputtering on the cathode surface are quantified. Quantifying this behavior is critical to understanding (and ultimately improving) spark plug reliability and electrode lifetime. For information contact us at info@esgeetech.com.

Announcements
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EsgeeTech will present at SAE 2016 World Congress at High-Fidelity Simulations of Spark-Plug Plasma Structure and Dynamics in Automotive Internal Combustion Engines. Above Event will take place on Wednesday, April 13, 2016. Please follow below link to view the venue and schedule. SAE 2016 World Congress

Announcements

Esgee Technologies will be represented at the joint 68th Gaseous Electronics Conference/ 9th International Conference on Reactive Plasmas to be held 12-16th October 2015 at the Hawaii Convention Center, Honolulu, Hawaii, USA. Esgee will host a booth at the conference and will also make two technical presentations titled: “Reactive radical production and transport analysis in ammonia-hydrogen-argon microwave plasmas“. EsgeeTech is also a proud sponsor of this conference. For more

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