OverViz Blog

icp-plasma-simulation-bias
December 12, 2017

Self-consistent ICP with Bias

This VizGlow example describes a self-consistent plasma simulation of an inductively coupled plasma (ICP) with a bias voltage. Typically, a quasi-neutral formulation is preferable over self-consistent for high density plasma discharges where Debye lengths become very small relative to geometric dimensions in the discharge. Sheath thickness become negligible compared to the physical system and can be ignored. This is common in ICP and microwave plasmas and under these conditions a quasi-neutral approximation may be made.

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November 27, 2017

OverViz Blog Announcement

  Esgee Technologies Inc. is excited to announce the release of our new OverViz Blog. The blog will be a growing collection of our news articles, press releases, application examples, and simulation advancements. Check-in regularly to learn about new ways for leveraging the OverViz Simulation Suite to solve complex multiphysics problems. If you have a specific request or would like to contribute to the OverViz Blog, please contact us at info@esgeetech.com.

Announcements
icp-plasma-simulation-vizglow

Plasma processing reactors are used to accomplish a variety of unit steps in a semiconductor integrated circuit manufacture. In most cases, complex feed gas mixtures are used in a plasma reactor to realize precise etch, deposition, doping, cleaning and other types of processes.  The VizGlow Plasma Modeling Software Package provide capability for modeling plasma reactors with complex reactive plasma chemistries in the gas phase and at reactive surfaces.  This technical note discusses the simulation of

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Esgee Technologies will present “Computational Modeling of Microwave Interactions with Self-consistent Plasma” at the 70th Annual Gaseous Electronics Conference in Pittsburgh, PA on Nov. 7th, 2017. This talk will address current challenges in computational modeling of microwave-sustained plasmas. Examples include discharges sustained by surface wave propagation (SWP) along plasma- dielectric interface (SPP) and discharged sustained by SWP along the plasma-sheath interface (MVP). These are important processes for the creation and sustenance of plasmas in industrial scale plasma reactors

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Dielectric Barrier Discharges (DBD) are stable discharges capable of generating reactive non-equilibrium plasmas at high pressures.  Operation of these discharges at atmospheric pressure is particularly attractive for a number of applications including vacuum-chamber free materials processing, chemical processing of gas streams, and plasma actuators for aerodynamic flow control.  In non-ideal gases such as air, DBD’s produce large volume plasmas through the formation of a multitude of thin streamer channels that can fill the available space

Applications