Fluid vs Hybrid Plasma Formulations for IEADFs in Semiconductor Reactors

February 20th, 2018 Capacitively Coupled Plasma Simulation in VizGlow

Ion energy and angular distribution functions (IEADFs) characterize the anisotropic impact behavior of ions onto wafer surfaces in cold plasma reactive ion etchers (RIE). IEADFs can be used to quantify the etching performance and guide reactor design in the semiconductor fabrication process. Reducing the angles of ion impact at the wafer surface sharpens the resolution of the etching process, enabling the production of smaller etched features. Controlling the ion energy distributions also offers control over […]

OverViz 2.2.1 Released

February 7th, 2018

Esgee Technologies Inc. would like to announce the release of OverViz Suite v2.2.1. This release contains minor bug fixes and software maintenance updates for improved usability. New installers and installation instructions are available for download from the Esgee Corporate Portal.

Ion Momentum and Drift Diffusion Approximation in VizGlow

February 7th, 2018

When setting up a new non-equilibrium plasma simulation in VizGlow, the user must select an ion momentum model. Two available options in VizGlow are “Solve ion momentum equation” and “Use drift-diffusion approximation.” This discussion is intended to help a new user understand the differences between these options and to determine which selection is appropriate for their problem. The drift-diffusion relationships are derived from the species momentum equations and characterizes the spatial transport of particles. Drift […]