ICP Reactor with Coupled Plasma, EM Wave and Gas Flow

May 20th, 2017

This application overview discusses the modeling of a flow-through Inductively Coupled Plasma (ICP) reactor with VizGlow and provides an example of tightly coupled multi-physics simulations with the software.  Discharge physics including multi-temperature, multi-species transport, and finite-rate plasma chemistry effects are coupled to electromagnetic wave phenomena driven by inductive coils, and a bulk fluid flow through an inlet/outlet configuration. The geometry and mesh for the plasma discharge simulation are shown in Figure 1.  The axisymmetric discharge comprises a […]

Microwave Reactor in the Frequency Domain

May 1st, 2017 3D Microwave Plasma MWP Simulation in VizGlow

This example application simulates a steady microwave field in a three-dimensional plasma reactor using in semiconductor materials processing.  The Frequency-Domain Electromagnetic Wave Solver Module of the VizEM is used for this problem. The geometry for the simulation is shown in Figure 1 and comprises a cylindrical processing reactor with an air-filled waveguide port in the top center of the reactor.  The waveguide is rectangular in cross section and comprises an L-bend with a 45o mirror surface […]

CCP Reactor for Semiconductor Materials Processing

May 1st, 2017 ccp-plasma-simulation-vizglow

Capacitively Coupled Plasma (CCP) discharges in parallel-plate configuration are commonly used in semiconductor and other materials processing applications.  These discharges provide a compact platform in which a plasma can be generated to process a flat wafer surface.  The highly directional ion impact at the wafer surface with high ion impact energies is beneficial to a number of wafer processes; in particular for etch processes.  This application note discusses the simulation of a typical CCP reactor […]